Updated on 2024/12/22

写真a

 
YAMAMOTO,Mahito
 
Organization
Faculty of Engineering Science Associate Professor
Title
Associate Professor
External link

Degree

  • Ph.D. (Physics) ( 2013.7 )

Research Interests

  • Steep-slope transistors

  • Phase change materials

  • 2D materials

  • Nano Materials

  • Surce Physics

  • Correlated oxides

  • van der Waals heterostructures

  • Vanadium dioxide

  • Hexagonal boron nitride

  • Transition metal dichalcogenides

  • Graphene

  • Memory

  • Sensors

Research Areas

  • Natural Science / Semiconductors, optical properties of condensed matter and atomic physics

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electron device and electronic equipment  / Transistors, sensors, memory

Education

  • University of Maryland   Department of Physics

    2008.8 - 2013.7

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  • Osaka University   Graduate School of Engineering   Department of Applied Physics

    2006.4 - 2008.3

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  • Osaka University   Department of Engineering   Division of Applied Science

    2002.4 - 2006.3

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Research History

  • Kansai University   Faculty of Engineering Science Department of Pure and Applied Physics   Associate Professor

    2021.4

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  • Kansai University   Faculty of Engineering Science Department of Pure and Applied Physics   Assistant Professor

    2020.4 - 2021.3

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  • Osaka Univeristy   Institute of Industrial and Scientific Research   Assistant Professor

    2016.4 - 2020.3

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  • National Institute for Materials Science   International Center for Materials Nanoarchitectonics   Postdoctoral Fellow

    2013.8 - 2016.3

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  • University of Maryland   Department of Physics   Research Assistantship

    2008.8 - 2013.7

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Professional Memberships

Papers

  • Spatial and reconfigurable control of photoluminescence from single-layer MoS2 using a strained VO2-based Fabry–Pérot cavity

    Koyo Nakayama, Shota Toida, Takahiko Endo, Mitsuru Inada, Shingo Sato, Hiroshi Tani, Kenji Watanabe, Takashi Taniguchi, Keiji Ueno, Yasumitsu Miyata, Kazunari Matsuda, Mahito Yamamoto

    Applied Physics Letters   125 ( 22 )   2024.11

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    Publishing type:Research paper (scientific journal)   Publisher:AIP Publishing  

    We investigated the photoluminescence (PL) from single-layer MoS2 on VO2 platelets grown on SiO2, where the insulating and metallic phases can coexist above a bulk transition temperature of 340 K, due to the inhomogeneous strain. We found that the intensity of PL from MoS2 on metallic VO2 is higher than that on the insulating counterpart, resulting in spatially varying PL even at the sub-micrometer scale. In contrast to the intensity, the PL peak energies were observed to be nearly identical on insulating and metallic VO2, indicating that the influences of charge transfer, strain, and dielectric screening on MoS2 are comparable, regardless of the phase state. Thus, the observed difference in PL intensity is due to the difference in refractive indices of insulating and metallic VO2, leading to the phase-dependent Fabry–Pérot interference effect. We performed numerical simulations for the emission from MoS2 supported on the VO2-based Fabry–Pérot interferometer. The calculated emission intensity ratio on insulating and metallic VO2 well reproduces the experimental observations. These results suggest a strategy for controlling PL from two-dimensional semiconductors in a spatial and reconfigurable manner.

    DOI: 10.1063/5.0236517

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  • A reconfigurable transistor and memory based on a two-dimensional heterostructure and photoinduced trapping

    Meng-Yu Tsai, Chia-Tse Huang, Che-Yi Lin, Mu-Pai Lee, Feng-Shou Yang, Mengjiao Li, Yuan-Ming Chang, Kenji Watanabe, Takashi Taniguchi, Ching-Hwa Ho, Wen-Wei Wu, Mahito Yamamoto, Jiunn-Lin Wu, Po-Wen Chiu, Yen-Fu Lin

    Nature Electronics   6 ( 10 )   755 - 764   2023.9

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    Publishing type:Research paper (scientific journal)   Publisher:Springer Science and Business Media LLC  

    DOI: 10.1038/s41928-023-01034-7

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    Other Link: https://www.nature.com/articles/s41928-023-01034-7

  • Diffused Beam Energy to Dope van der Waals Electronics and Boost Their Contact Barrier Lowering

    Che-Yi Lin, Mu-Pai Lee, Yuan-Ming Chang, Yi-Tang Tseng, Feng-Shou Yang, Mengjiao Li, Jiann-Yeu Chen, Ciao-Fen Chen, Meng-Yu Tsai, Yi-Chun Lin, Keiji Ueno, Mahito Yamamoto, Shun-Tsung Lo, Chen-Hsin Lien, Po-Wen Chiu, Kazuhito Tsukagoshi, Wen-Wei Wu, Yen-Fu Lin

    ACS Applied Materials & Interfaces   14 ( 36 )   41156 - 41164   2022.8

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    Publishing type:Research paper (scientific journal)   Publisher:American Chemical Society (ACS)  

    DOI: 10.1021/acsami.2c07679

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  • Step-like resistance changes in VO2 thin films grown on hexagonal boron nitride with <i>in situ</i> optically observable metallic domains

    Shingo Genchi, Mahito Yamamoto, Takuya Iwasaki, Shu Nakaharai, Kenji Watanabe, Takashi Taniguchi, Yutaka Wakayama, Hidekazu Tanaka

    Applied Physics Letters   120 ( 5 )   2022.1

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    Publishing type:Research paper (scientific journal)   Publisher:AIP Publishing  

    Vanadium dioxide (VO2) thin films grown on hexagonal boron nitride (hBN) flakes show three orders of magnitude resistance change due to metal–insulator transition (MIT). The MIT property of VO2 thin films is strongly dependent on the metallic domain size, which should be identified to derive the resistance change owing to the single metallic domain. In this study, we investigated the relationship between the metallic domain size and the device-size-dependent MIT property of VO2 thin films grown on hBN. We observed by temperature-dependent Raman spectroscopy and optical microscopy the emergence of the metallic domains and determined the metallic domain size in VO2 thin films grown on hBN. The metallic domain size of the VO2 thin films grown on hBN was determined to be ∼500 nm on average in length and up to sub-micrometer scale. Electric transport measurements revealed that VO2/hBN microwires exhibit multi-level step-like resistivity changes that change by one to two orders when the length and width are ∼2 μm owing to the confined metallic domains in the micrometer scale. Our results open a way for VO2 devices, showing a steep and large resistance change even in the micrometer scale.

    DOI: 10.1063/5.0072746

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  • Electrostatic potential measurement at the Pt/TiO2 interface using electron holography

    Hiroshi Nakajima, Toshiaki Tanigaki, Takaaki Toriyama, Mahito Yamamoto, Hidekazu Tanaka, Yasukazu Murakami

    Journal of Applied Physics   129 ( 17 )   174304 - 174304   2021.5

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    DOI: 10.1063/5.0046501

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  • Barrier Formation at the van der Waals Contacts of Vanadium Dioxide and Transition Metal Dichalcogenides Reviewed

    Mahito Yamamoto, Ryo Nouchi, Teruo Kanki, Shu Nakaharai, Azusa Hattori, Kenji Watanabe, Takashi Taniguchi, Yutaka Wakayama, Keiji Ueno, Hidekazu Tanaka

    ACS Applied Materials & Intefaces   11   36871 - 36879   2019.9

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1021/acsami.9b13763

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  • Broad range thickness identification of hexagonal boron nitride by colors Reviewed

    Yuto Anzai, Mahito Yamamoto, Shingo Genchi, Kenji Watanabe, Takashi Taniguchi, Shuhei Ichikawa, Yasufumi Fujiwara, Hidekazu Tanaka

    Applied Physics Express   12 ( 5 )   055007   2019.5

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    Language:English   Publishing type:Research paper (scientific journal)  

    © 2019 The Japan Society of Applied Physics. Thicknesses of hexagonal boron nitride (hBN) on SiO2 were identified by the colors in the wide range from a few to hundreds of nanometers. We theoretically determined the colors of hBN on SiO2 as a function of the thickness in the standard red green blue (sRGB) color space. Theoretical RGB values of hBN with a given thickness were found to be in good agreement with those extracted from optical images, suggesting that the colors can be a standard for the thickness identification. This thickness identification method is facile, rapid, and versatile, and, therefore, would spur further researches on hBN.

    DOI: 10.7567/1882-0786/ab0e45

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  • Growth of vanadium dioxide thin films on hexagonal boron nitride flakes as transferrable substrates Reviewed

    Shingo Genchi, Mahito Yamamoto, Koji Shigematsu, Shodai Aritomi, Ryo Nouchi, Teruo Kanki, Kenji Watanabe, Takashi Taniguchi, Yasukazu Murakami, Hidekazu Tanaka

    Scientific Reports   9 ( 1 )   3857   2019.2

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  • Gate-Tunable Thermal Metal-Insulator Transition in VO2 Monolithically Integrated into a WSe2 Field-Effect Transistor Reviewed

    Mahito Yamamoto, Ryo Nouchi, Teruo Kanki, Azusa N Hattori, Kenji Watanabe, Takashi Taniguchi, Keiji Ueno, Hidekazu Tanaka

    ACS applied materials & interfaces   11 ( 3 )   3224 - 3230   2019.1

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  • Correlation between Ni Valence and Resistance Modulation on a SmNiO3 Chemical Transistor Reviewed

    Daiki Kawamoto, Azusa N Hattori, Mahito Yamamoto, Xin Liang Tan, Ken Hattori, Hiroshi Daimon, Hidekazu Tanaka

    ACS Applied Electronic Materials   1 ( 1 )   82 - 87   2018.12

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  • Layer-by-Layer Oxidation Induced Electronic Properties in Transition-Metal Dichalcogenides Reviewed

    Das Soumya Ranjan, Wakabayashi Katsunori, Yamamoto Mahito, Tsukagoshi Kazuhito, Dutta Sudipta

    JOURNAL OF PHYSICAL CHEMISTRY C   122 ( 29 )   17001 - 17007   2018.7

  • Pronounced photogating effect in atomically thin WSe2 with a self-limiting surface oxide layer Reviewed

    Mahito Yamamoto, Keiji Ueno, Kazuhito Tsukagoshi

    Applied Physics Letters   112 ( 18 )   2018.4

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:American Institute of Physics Inc.  

    The photogating effect is a photocurrent generation mechanism that leads to marked responsivity in two-dimensional (2D) semiconductor-based devices. A key step to promote the photogating effect in a 2D semiconductor is to integrate it with a high density of charge traps. Here, we show that self-limiting surface oxides on atomically thin WSe2 can serve as effective electron traps to facilitate p-type photogating. By examining the gate-bias-induced threshold voltage shift of a p-type transistor based on single-layer WSe2 with surface oxide, the electron trap density and the trap rate of the oxide are determined to be &gt
    1012 cm-2 and &gt
    1010 cm-2 s-1, respectively. White-light illumination on an oxide-covered 4-layer WSe2 transistor leads to the generation of photocurrent, the magnitude of which increases with the hole mobility. During illumination, the photocurrent evolves on a timescale of seconds, and a portion of the current persists even after illumination. These observations indicate that the photogenerated electrons are trapped deeply in the surface oxide and effectively gate the underlying WSe2. Owing to the pronounced photogating effect, the responsivity of the oxide-covered WSe2 transistor is observed to exceed 3000 A/W at an incident optical power of 1.1 nW, suggesting the effectiveness of surface oxidation in facilitating the photogating effect in 2D semiconductors.

    DOI: 10.1063/1.5030525

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  • Virtual substrate method for nanomaterials characterization Reviewed

    Bo Da, Jiangwei Liu, Mahito Yamamoto, Yoshihiro Ueda, Kazuyuki Watanabe, Nguyen Thanh Cuong, Songlin Li, Kazuhito Tsukagoshi, Hideki Yoshikawa, Hideo Iwai, Shigeo Tanuma, Hongxuan Guo, Zhaoshun Gao, Xia Sun, Zejun Ding

    NATURE COMMUNICATIONS   8   2017.5

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:NATURE PUBLISHING GROUP  

    Characterization techniques available for bulk or thin-film solid-state materials have been extended to substrate-supported nanomaterials, but generally non-quantitatively. This is because the nanomaterial signals are inevitably buried in the signals from the underlying substrate in common reflection-configuration techniques. Here, we propose a virtual substrate method, inspired by the four-point probe technique for resistance measurement as well as the chop-nod method in infrared astronomy, to characterize nanomaterials without the influence of underlying substrate signals from four interrelated measurements. By implementing this method in secondary electron (SE) microscopy, a SE spectrum (white electrons) associated with the reflectivity difference between two different substrates can be tracked and controlled. The SE spectrum is used to quantitatively investigate the covering nanomaterial based on subtle changes in the transmission of the nanomaterial with high efficiency rivalling that of conventional core-level electrons. The virtual substrate method represents a benchmark for surface analysis to provide 'free-standing' information about supported nanomaterials.

    DOI: 10.1038/ncomms15629

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  • Measuring the Complex Optical Conductivity of Graphene by Fabry-Perot Reflectance Spectroscopy Reviewed

    Behnood G. Ghamsari, Jacob Tosado, Mahito Yamamoto, Michael S. Fuhrer, Steven M. Anlage

    SCIENTIFIC REPORTS   6   2016.9

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:NATURE PUBLISHING GROUP  

    We have experimentally studied the dispersion of optical conductivity in few-layer graphene through reflection spectroscopy at visible wavelengths. A laser scanning microscope (LSM) with a supercontinuum laser source measured the frequency dependence of the reflectance of exfoliated graphene flakes, including monolayer, bilayer and trilayer graphene, loaded on a Si/SiO2 Fabry-Perot resonator in the 545-700 nm range. The complex refractive index of few-layer graphene, n - ik, was extracted from the reflectance contrast to the bare substrate. It was found that each few-layer graphene possesses a unique dispersionless optical index. This feature indicates that the optical conductivity does not simply scale with the number of layers, and that inter-layer electrodynamics are significant at visible energies.

    DOI: 10.1038/srep34166

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  • Carrier Polarity Control in alpha-MoTe2 Schottky Junctions Based on Weak Fermi-Level Pinning Reviewed

    Shu Nakaharai, Mahito Yamamoto, Keiji Ueno, Kazuhito Tsukagoshi

    ACS APPLIED MATERIALS & INTERFACES   8 ( 23 )   14732 - 14739   2016.6

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    The polarity of the charge carriers injected through Schottky junctions of a-phase molybdenum ditelluride (alpha-MoTe2) and various metals was characterized. We found that the Fermi-level pinning in the metal/alpha-MoTe2 Schottky junction is so weak that the polarity of the carriers (electron or hole) injected from the junction can be controlled by the work function of the metals, in contrast to other transition metal dichalcogenides such as MoS2. From the estimation of the Schottky barrier heights, we obtained p-type carrier (hole) injection from a Pt/alpha-MoTe2 junction with a Schottky barrier height of 40 meV at the valence band edge. n-Type carrier (electron) injection from Ti/alpha-MoTe2 and Ni/alpha-MoTe2 junctions was also observed with Schottky barrier heights of 50 and 100 meV, respectively, at the conduction band edge. In addition, enhanced ambipolarity was demonstrated in a Pt-Ti hybrid contact with a unique structure specially designed for polarity-reversible transistors, in which Pt and Ti electrodes were placed in parallel for injecting both electrons and holes.

    DOI: 10.1021/acsami.6b02036

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  • Self-Limiting Oxides on WSe2 as Controlled Surface Acceptors and Low-Resistance Hole Contacts Reviewed

    Mahito Yamamoto, Shu Nakaharai, Keiji Ueno, Kazuhito Tsukagoshi

    NANO LETTERS   16 ( 4 )   2720 - 2727   2016.4

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    Transition metal oxides show much promise as effective p-type contacts and dopants in electronics based on transition metal dichalcogenides. Here we report that atomically thin films of under-stoichiometric tungsten oxides (WOx with x &lt; 3) grown on tungsten diselenide (WSe2) can be used as both controlled charge transfer dopants and low barrier contacts for p-type WSe2 transistors. Exposure of atomically thin WSe2 transistors to ozone (O-3) at 100 degrees C results in self-limiting oxidation of the WSe2 surfaces to conducting WOx films. WOx-covered WSe2 is highly hole-doped due to surface electron transfer from the underlying WSe2 to the high electron affinity WOx. The dopant concentration can be reduced by suppressing the electron affinity of WOx by air exposure, but exposure to O-3 at room temperature leads to the recovery of the electron affinity. Hence, surface transfer doping with WOx is virtually controllable. Transistors based on WSe2 covered with WOx show only p-type conductions with orders of magnitude better on-current, on/off current ratio, and carrier mobility than without WOx, suggesting that the surface WOx, serves as a p-type contact with a low hole Schottky barrier. Our findings point to a simple and effective strategy for creating p-type devices based on two-dimensional transition metal dichalcogenides with controlled dopant concentrations.

    DOI: 10.1021/acs.nanolett.6b00390

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  • Origin of Noise in Layered MoTe2 Transistors and its Possible Use for Environmental Sensors Reviewed

    Yen-Fu Lin, Yong Xu, Che-Yi Lin, Yuen-Wuu Suen, Mahito Yamamoto, Shu Nakaharai, Keiji Ueno, Kazuhito Tsukagoshi

    ADVANCED MATERIALS   27 ( 42 )   6612 - +   2015.11

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:WILEY-V C H VERLAG GMBH  

    Low-frequency current fluctuations are monitored and the mechanism of electric noise investigated in layered 2H-type a-molybdenum ditelluride transistors. The charge transport mechanism of electric noise in atomically thin transitionmetal dichalcogenides is studied under different environments; the development of a new sensing functionality may be stimulated.

    DOI: 10.1002/adma.201502677

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  • Electrostatically Reversible Polarity of Ambipolar alpha-MoTe2 Transistors Reviewed

    Shu Nakaharai, Mahito Yamamoto, Keiji Ueno, Yen-Fu Lin, Song-Lin Li, Kazuhito Tsukagoshi

    ACS NANO   9 ( 6 )   5976 - 5983   2015.6

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    A doping-free transistor made of ambipolar cc-phase molybdenum ditelluride (alpha-MoTe2) is proposed in which the transistor polarity (p-type and n-type) is electrostatically controlled by dual top gates. The voltage signal in one of the gates determines the transistor polarity, while the other gate modulates the drain current. We demonstrate the transistor operation experimentally, with electrostatically controlled polarity of both p- and n-type in a single transistor.

    DOI: 10.1021/acsnano.5b00736

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  • Double resonance Raman modes in monolayer and few-layer MoTe2 Reviewed

    Huaihong Guo, Teng Yang, Mahito Yamamoto, Lin Zhou, Ryo Ishikawa, Keiji Ueno, Kazuhito Tsukagoshi, Zhidong Zhang, Mildred S. Dresselhaus, Riichiro Saito

    PHYSICAL REVIEW B   91 ( 20 )   2015.5

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    We study the second-order Raman process of mono- and few-layer MoTe2, by combining ab initio density functional perturbation calculations with experimental Raman spectroscopy using 532, 633, and 785 nm excitation lasers. The calculated electronic band structure and the density of states show that the resonance Raman process occurs at the M point in the Brillouin zone, where a strong optical absorption occurs due to a logarithmic Van Hove singularity of the electronic density of states. The double resonance Raman process with intervalley electron-phonon coupling connects two of the three inequivalent M points in the Brillouin zone, giving rise to second-order Raman peaks due to the M-point phonons. The calculated vibrational frequencies of the second-order Raman spectra agree with the observed laser-energy-dependent Raman shifts in the experiment.

    DOI: 10.1103/PhysRevB.91.205415

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  • Self-Limiting Layer-by-Layer Oxidation of Atomically Thin WSe2 Reviewed

    Mahito Yamamoto, Sudipta Dutta, Shinya Aikawa, Shu Nakaharai, Katsunori Wakabayashi, Michael S. Fuhrer, Keiji Ueno, Kazuhito Tsukagoshi

    NANO LETTERS   15 ( 3 )   2067 - 2073   2015.3

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    Growth of a uniform oxide film with a tunable thickness on two-dimensional transition Metal dichalcogenides is of great importance for electronic and optoelectronic applications. Here we demonstrate homogeneous surface oxidation of atomically thin WSe2 with a self-limiting thickness from single- to trilayers. Exposure to ozone (O-3) below 100 degrees C leads to the lateral growth of tungsten oxide selectively along selenium zigzag-edge orientations on WSe2. With further O-3 exposure, the oxide regions coalesce and oxidation terminates leaving a uniform thickness oxide film on top of unoxidized WSe2. At higher temperatures, oxidation evolves in the layer-by-layer regime up to trilayers. The oxide films formed on WSe2 are nearly atomically flat. Using photoluminescence and Raman spectroscopy, we find that the underlying single-layer WSe2 is decoupled from the top oxide but hole-doped. Our findings offer a new strategy for creating atomically thin heterostructures of semiconductors and insulating oxides with potential for applications in electronic devices.

    DOI: 10.1021/nl5049753

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  • Thickness Scaling Effect on Interfacial Barrier and Electrical Contact to Two-Dimensional MoS2 Layers Reviewed

    Song-Lin Li, Katsuyoshi Komatsu, Shu Nakaharai, Yen-Fu Lin, Mahito Yamamoto, Xiangfeng Duan, Kazuhito Tsukagoshi

    ACS NANO   8 ( 12 )   12836 - 12842   2014.12

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    Understanding the interfacial electrical properties between metallic electrodes and low-dimensional semiconductors is essential for both fundamental science and practical applications. Here we report the observation of thickness reduction induced crossover of electrical contact at Au/MoS2 interfaces. For MoS2 thicker than 5 layers, the contact resistivity slightly decreases with reducing MoS2 thickness. By contrast, the contact resistivity sharply increases with reducing MoS2 thickness below 5 layers, mainly governed by the quantum confinement effect. We find that the interfacial potential barrier can be finely tailored from 0.3 to 0.6 eV by merely varying MoS2 thickness. A full evolution diagram of energy level alignment is also drawn to elucidate the thickness scaling effect. The finding of tailoring interfacial properties with channel thickness represents a useful approach controlling the metal/semiconductor interfaces which may result in conceptually innovative functionalities.

    DOI: 10.1021/nn506138y

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  • Spin injection and detection in a graphene lateral spin valve using an yttrium-oxide tunneling barrier Reviewed

    Katsuyoshi Komatsu, Shinya Kasai, Song-Lin Li, Shu Nakaharai, Nobuhiko Mitoma, Mahito Yamamoto, Kazuhito Tsukagoshi

    APPLIED PHYSICS EXPRESS   7 ( 8 )   2014.8

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:IOP PUBLISHING LTD  

    We demonstrate charge and spin current transport in a graphene-based lateral spin valve using yttrium oxide (Y-O) as a tunneling barrier between graphene and a ferromagnetic electrode. A Y-O layer grown on graphene is flat, with a root-mean-square roughness of 0.17 nm, which is much lower than that of conventional barrier materials. This flatness allows the utilization of a very thin but well-defined tunneling barrier, leading to a large spin signal of similar to 20 Omega and a high spin injection efficiency of 15% with a low contact resistance of similar to 1 k Omega. These findings represent important progress toward the realization of graphene-based spintronics applications. (C) 2014 The Japan Society of Applied Physics

    DOI: 10.7567/APEX.7.085101

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  • Ambipolar MoTe2 Transistors and Their Applications in Logic Circuits Reviewed

    Yen-Fu Lin, Yong Xu, Sheng-Tsung Wang, Song-Lin Li, Mahito Yamamoto, Alex Aparecido-Ferreira, Wenwu Li, Huabin Sun, Shu Nakaharai, Wen-Bin Jian, Keiji Ueno, Kazuhito Tsukagoshi

    ADVANCED MATERIALS   26 ( 20 )   3263 - +   2014.5

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:WILEY-V C H VERLAG GMBH  

    We report ambipolar charge transport in a-molybdenum ditelluride (MoTe2) flakes, whereby the temperature dependence of the electrical characteristics was systematically analyzed. The ambipolarity of the charge transport originated from the formation of Schottky barriers at the metal/MoTe2 contacts. The Schottky barrier heights as well as the current on/off ratio could be modified by modulating the electrostatic fields of the back-gate voltage (V-bg) and drain-source voltage (V-ds). Using these ambipolar MoTe2 transistors we fabricated complementary inverters and amplifiers, demonstrating their feasibility for future digital and analog circuit applications.

    DOI: 10.1002/adma.201305845

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  • Strong Enhancement of Raman Scattering from a Bulk-Inactive Vibrational Mode in Few-Layer MoTe2 Reviewed

    Mahito Yamamoto, Sheng Tsung Wang, Meiyan Ni, Yen-Fu Lin, Song-Lin Li, Shinya Aikawa, Wen-Bin Jian, Keiji Ueno, Katsunori Wakabayashi, Kazuhito Tsukagoshi

    ACS NANO   8 ( 4 )   3895 - 3903   2014.4

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    Two-dimensional layered crystals could show phonon properties that are markedly distinct from those of their bulk counterparts, because of the loss of periodicities along the c-axis directions. Here we investigate the phonon properties of bulk and atomically thin alpha-MoTe2 using Raman spectroscopy. The Raman spectrum of alpha-MoTe2 shows a prominent peak of the in-plane E-2g(1) mode, with its frequency upshifting with decreasing thickness down to the atomic scale, similar to other dichalcogenides. Furthermore, we find large enhancement of the Raman scattering from the out-of-plane B-2g(1) mode in the atomically thin layers. The B-2g(1) models Raman inactive in the bulk, but is observed to become active in the few-layer films. The intensity ratio of the B-2g(1) to E-2g(1) peaks evolves significantly with decreasing thickness, in contrast with other dichalcogenides. Our observations point to strong effects of dimensionality on the phonon properties of MoTe2.

    DOI: 10.1021/nn5007607

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  • Anisotropic Etching of Atomically Thin MoS2 Reviewed

    Mahito Yamamoto, Theodore L. Einstein, Michael S. Fuhrer, William G. Cullen

    JOURNAL OF PHYSICAL CHEMISTRY C   117 ( 48 )   25643 - 25649   2013.12

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    Exposure to oxygen at 300-340 degrees C results in triangular etch pits with uniform orientation on the surfaces of atomically thin molybdenum disulfide (MoS2), indicating anisotropic etching terminating on lattice planes. The triangular pits grow laterally with oxidation time. The density of pits scarcely depends on oxidation time, temperature, and MoS2 thickness but varies significantly from sample to sample, indicating that etching is initiated at native defect sites on the basal plane surface rather than activated by substrate effects such as charged impurities or surface roughness. Raman spectroscopy confirms that oxygen treatment produces no molybdenum oxide (MoO3) below 340 degrees C. However, upon oxidation above 200 degrees C, the Raman A(1g) mode upshifts and the linewidth decreases, indicating p-type doping of MoS2. Oxidation at 400 degrees C results in complete conversion to MoO3.

    DOI: 10.1021/jp410893e

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  • "The Princess and the Pea" at the Nanoscale: Wrinkling and Delamination of Graphene on Nanoparticles Reviewed

    Mahito Yamamoto, Olivier Pierre-Louis, Jia Huang, Michael S. Fuhrer, Theodore L. Einstein, William G. Cullen

    PHYSICAL REVIEW X   2 ( 4 )   2012.12

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER PHYSICAL SOC  

    Thin membranes exhibit complex responses to external forces or geometrical constraints. A familiar example is the wrinkling, exhibited by human skin, plant leaves, and fabrics, that results from the relative ease of bending versus stretching. Here, we study the wrinkling of graphene, the thinnest and stiffest known membrane, deposited on a silica substrate decorated with silica nanoparticles. At small nanoparticle density, monolayer graphene adheres to the substrate, detached only in small regions around the nanoparticles. With increasing nanoparticle density, we observe the formation of wrinkles which connect nanoparticles. Above a critical nanoparticle density, the wrinkles form a percolating network through the sample. As the graphene membrane is made thicker, global delamination from the substrate is observed. The observations can be well understood within a continuum-elastic model and have important implications for strain-engineering the electronic properties of graphene.

    DOI: 10.1103/PhysRevX.2.041018

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  • Charge Inhomogeneity Determines Oxidative Reactivity of Graphene on Substrates Reviewed

    Mahito Yamamoto, Theodore L. Einstein, Michael S. Fuhrer, William G. Cullen

    ACS NANO   6 ( 9 )   8335 - 8341   2012.9

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:AMER CHEMICAL SOC  

    Single-layer graphene (SLG) supported on SiO2 shows anomalously large chemical reactivity compared to thicker graphene, with charge inhomogeneity-induced potential fluctuations or topographic corrugations proposed as the cause. Here we systematically probe the oxidative reactivity of graphene supported on substrates with different surface roughnesses and charged impurity densities: hexagonal boron nitride (hBN), mica, thermally grown SiO2 on Si, and SiO2 nanoparticle thin films. SLG on low charge trap density hBN is not etched and shows little doping after oxygen treatment at temperatures up to 550 degrees C, in sharp contrast with oxidative etching under similar conditions of graphene on high charge trap density SiO2 and mica. Furthermore, bilayer graphene shows reduced reactivity compared to SLG regardless of its substrate-induced roughness. Together the observations indicate that graphene's reactivity is predominantly controlled by charge inhomogeneity-induced potential fluctuations rather than surface roughness.

    DOI: 10.1021/nn303082a

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  • Modeling noncontact atomic force microscopy resolution on corrugated surfaces Reviewed

    Kristen M. Burson, Mahito Yamamoto, William G. Cullen

    BEILSTEIN JOURNAL OF NANOTECHNOLOGY   3   230 - 237   2012.3

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    Key developments in NC-AFM have generally involved atomically flat crystalline surfaces. However, many surfaces of technological interest are not atomically flat. We discuss the experimental difficulties in obtaining high-resolution images of rough surfaces, with amorphous SiO2 as a specific case. We develop a quasi-1-D minimal model for noncontact atomic force microscopy, based on van der Waals interactions between a spherical tip and the surface, explicitly accounting for the corrugated substrate (modeled as a sinusoid). The model results show an attenuation of the topographic contours by similar to 30% for tip distances within 5 angstrom of the surface. Results also indicate a deviation from the Hamaker force law for a sphere interacting with a flat surface.

    DOI: 10.3762/bjnano.3.26

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  • HIGH RESOLUTION MICROSCOPY OF SIO2 AND THE STRUCTURE OF SIO2-SUPPORTED GRAPHENE Reviewed

    Kristen M. Burson, Mahito Yamamoto, William G. Cullen

    PROCEEDINGS OF THE ASME INTERNATIONAL DESIGN ENGINEERING TECHNICAL CONFERENCES AND COMPUTERS AND INFORMATION IN ENGINEERING CONFERENCE, VOL 7   551 - 555   2012

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    Language:English   Publishing type:Research paper (international conference proceedings)   Publisher:AMER SOC MECHANICAL ENGINEERS  

    Graphene has attracted great interest due to its exceptional electrical, mechanical, and chemical properties since its discovery in 2004. Since its first realization, the substrate of choice for graphene exfoliation has been Si wafer with approximately 300 nm thick SiO2 dielectric layer, because it allows 1) direct optical detection of monolayer flakes, and 2) a convenient back gate with dielectric for controlling carrier density in the graphene. However; the amorphous structure of SiO2 and its associated surface roughness has led to ongoing controversy in determining the structure of SiO2-supported graphene. The conductivity of graphene allows scanning tunneling microscopy (STM) to be used to measure its topography, generally allowing its structure to be atomically resolved. In contrast, the insulating SiO2 must be probed with atomic force microscopy (AFM), and this is often done using ambient tapping-mode AFM. STM measurements of graphene on SiO2 generally show greater roughness and finer corrugation than is seen in AFM measurements of SiO2, and this has been interpreted as evidence for "intrinsic" corrugation of the graphene. However, when the energetics of adhesion and elasticity are considered, the idea of intrinsic structure becomes quite controversial for graphene supported on a substrate. Here we show that UHV non-contact AFM (NC-AFM) measurement of SiO2 reveals structure unresolved in previous measurements, and shows both greater roughness and smaller lateral feature size than seen for graphene measured by STM. High-resolution measurement of the SiO2 topography enables an analysis based on the energetics of graphene bending and adhesion, showing that the graphene structure is highly conformal to the SiO2 beneath it. The topographies reported here contrast the atomically-flat crystalline surfaces used in benchmark NC-AFM measurements. They pose unique challenges for measurement resolution, and highlight the very different physical mechanisms which determine resolution in STM vs. NC-AFM. We discuss these issues and our recent efforts at quantitative modeling of the imaging process, with particular focus on the role of van der Waals forces and their contribution to the image signal.

    DOI: 10.1115/DETC2011-48737

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  • High-Fidelity Conformation of Graphene to SiO2 Topographic Features Reviewed

    W. G. Cullen, M. Yamamoto, K. M. Burson, J. H. Chen, C. Jang, L. Li, M. S. Fuhrer, E. D. Williams

    PHYSICAL REVIEW LETTERS   105 ( 21 )   215504   2010.11

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    High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion. Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating conformal adhesion can be highly effective for strain engineering of graphene.

    DOI: 10.1103/PhysRevLett.105.215504

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  • Anomalous decay of multilayer holes on SrTiO3(001) Reviewed

    Mahito Yamamoto, Koichi Sudoh, Hiroshi Iwasaki, Ellen D. Williams

    PHYSICAL REVIEW B   82 ( 11 )   2010.9

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    The decay behavior of nanoscale multilayer holes on SrTiO3(001) has been studied using scanning tunneling microscopy. The multilayer hole shrinks rigidly keeping steps in bunches, which is followed by rapid decay of a bottom single or a few layers in the hole at a critical volume. Both the critical volume and the number of layers exhibiting the rapid decay increase with depth of the hole. We have found that the anomalous morphological evolution during decay is induced as a result of the competition between the curvature effect and the short-range attractive step interaction. The attractive interaction gives rise to metastable step configurations of the bunching in the hole. Then the metastable state vanishes at the critical volume due to the enhanced curvature effect with decrease in size, which causes the debunching of the steps. The presented experimental results combined with a numerical simulation based on a step-flow model allowing for attractive step interactions have revealed that the depth of the step interaction potential well on SrTiO3(001) is approximately 4.6 +/- 2.0 meV.

    DOI: 10.1103/PhysRevB.82.115436

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  • Decay of multilayer holes on SrTiO3(001) Reviewed

    M. Yamamoto, K. Sudoh, H. Iwasaki

    SURFACE SCIENCE   601 ( 5 )   1255 - 1258   2007.3

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:ELSEVIER SCIENCE BV  

    We have studied the decay kinetics of nanoscale multilayer holes on SrTiO3(001) surfaces, using variable temperature scanning tunneling microscopy. We have performed real time observation of the decay of multilayer holes with diameters of 10 nm order at 750 degrees C. We have found that the hole decays, filling layer by layer from the bottom while expanding the periphery of the hole. We have performed numerical simulations of hole decay based oil a step flow model. The observed decay kinetics is found to be diffusion limited with local mass conservation. (c) 2006 Elsevier B.V. All rights reserved.

    DOI: 10.1016/j.susc.2006.12.036

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Books

  • 半導体・磁性体・電池の固/固界面制御と接合・積層技術

    山本 真人( Role: Contributor第3節 2次元半導体応用のための界面・表面制御)

    S&T出版  2024.6 

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  • System-Materials Nanoarchitectonics

    Mahito Yamamoto, Kazuhito Tsukagoshi( Role: ContributorGrowth and Electronic and Optoelectronic Applications of Surface Oxides on Atomically Thin WSe2)

    Springer Nature  2022 

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  • 酸化物・原子層物質ハイブリッドによる新奇デバイスの創製

    山本 真人, 田中 秀和

    金属  2018.2 

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  • Frontier of Layered Chalcogenide Materials Research

    Mahito Yamamoto( Role: ContributorChapter 8 Raman Spectroscopy of Transition Metal Dichalcogenides)

    CMC Publishing Co.,Ltd  2016.7 

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Presentations

  • Transfer characteristics of transition metal dichalcogenide transistors with VO2 contacts

    YAMAMOTO,Mahito, NOUCHI, RYO, KANKI, Teruo, NAKAHARAI, Shu, HATTORI, Azusa, WATANABE, Kenji, TANIGUCHI, Takashi, WAKAYAMA, Yutaka, UENO, Keiji, TANAKA, Hidekazu

    Recent Progress on Graphene and 2D Materials Research 2019  2019.10 

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  • Phase transition FETs based on two-dimensional WSe2 with VO2 contacts

    YAMAMOTO,Mahito, NOUCHI, Ryo, KANKI, Teruo, NAKAHARAI, Shu, HATTORI, Azusa, WATANABE, Kenji, TANIGUCHI, Takashi, WAKAYAMA, Yutaka, UENO, Keiji, TANAKA, Hidekazu

    26th INTERNATIONAL WORKSHOP ON OXIDE ELECTRONICS  2019.10 

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    Venue:Kyoto, Japan  

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  • Carrier injection from VO2 into MoS2 and WSe2

    YAMAMOTO,Mahito, NOUCHI, Ryo, KANKI, Teruo, HATTORI, Azusa, WATANABE, Kenji, TANIGUCHI, Takashi, UENO, Keiji, TANAKA, Hidekazau

    2019 Annual Meeting of the Physical Society of Taiwan  2019.1 

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    Venue:Hsinchu, Taiwan  

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  • Steep-slope transistors based on 2D semiconductors contacted with the phase-change material VO2

    YAMAMOTO,Mahito, KANKI, Teruo, HATTORI, Azusa, NOUCHI, Ryo, WATANEBE, Kenji, TANIGUCHI, Takashi, UENO, Keiji, TANAKA, Hidekazau

    2018 MRS Spring Meeting and Exhibit  2018.4 

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    Venue:Phoenix, USA  

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  • Non-thermionic switching in an atomically thin WSe2 transistor with the phase-change material VO2 contact

    YAMAMOTO,Mahito, KANKI, Teruo, HATTORI, Azusa, NOUCHI, Ryo, WATANABE, Kenji, TANIGUCHI, Takashi, UENO, Keiji, TANAKA, Hidekazau

    APS March Meeting  2018.3 

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    Venue:Los Angeles, USA  

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Awards

  • 39th Japan Society of Applied Physics Young Scientist Presentation Award

    2016.3   Japan Society of Applied Physics   Thickness-controlled oxidation of atomically thin WSe2

    Mahito Yamamoto

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Research Projects

  • Two-dimensional semiconductor FET with a strongly correlated gate

    Grant number:24H01206  2024.4 - 2026.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Transformative Research Areas (A)

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    Grant amount:\7020000 ( Direct Cost: \5400000 、 Indirect Cost:\1620000 )

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  • van der Waals heterostructure devices based on two-dimensional correlated oxides

    Grant number:22H05472  2022.6 - 2024.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Transformative Research Areas (A)

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    Grant amount:\6760000 ( Direct Cost: \5200000 、 Indirect Cost:\1560000 )

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  • Monolithic phase change oscillator network based on two-dimensional materials

    Grant number:22K18816  2022.6 - 2024.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Challenging Research (Exploratory)

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    Grant amount:\6370000 ( Direct Cost: \4900000 、 Indirect Cost:\1470000 )

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  • Synthesis of Ultrathin Functional Oxides Using Atomically Thin Transition Metal Dichalcogenides as Oxidation Precursors

    Grant number:23K23182  2022.4 - 2026.3

    Japan Society for the Promotion of Science  Grants-in-Aid for Scientific Research  Grant-in-Aid for Scientific Research (B)

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    Grant amount:\17290000 ( Direct Cost: \13300000 、 Indirect Cost:\3990000 )

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  • 神経模倣コンピュータ応用に向けた超低消費電力二次元材料不揮発性メモリの創出

    2022 - 2024

    科学技術振興機構  国際的な科学技術共同研究などの推進 国際科学技術協力基盤整備事業 台湾 

    山本 真人

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    Authorship:Principal investigator 

    本研究は、将来的な神経模倣コンピュータへの応用展開を視野に入れ、二次元材料を基盤とする超低消費電力不揮発性メモリの創出を目指すものである。日本側チームは欠陥制御された二次元材料を用いた電荷トラップメモリ、および超低消費電力性を有するトンネル電界効果トランジスタ(FET)の開発を主に行う。一方、台湾側チームは化学制御された二次元材料トラップを用いたメモリの開発とトンネルFETの低消費電力動作実証を行う。各チームの研究によって得られた知見や技術を共有・統合することで、神経模倣コンピュータ実装に資する超低消費電力電荷トラップメモリの効果的開発とそのシナプスデバイス集積化を推進する。両チームによる共同研究を通して、二次元材料メモリに基づく神経模倣コンピュータの将来的な実用展開が期待される。

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  • 集積デバイス応用に向けたVO<sub>2</sub>ナノワイヤの一次元配向成長と一斉転写技術の開発

    2021.4 - 2022.3

    公益財団法人京都技術科学センター  研究開発助成 

    山本真人

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  • 機能性酸化物のリモートエピタキシャル成長技術の確立

    2019.7 - 2020.12

    公益財団法人村田学術振興財団  研究助成 

    山本真人

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  • Boosting the performance of monolithic phase change transistors and their logic applications

    2019.4 - 2021.3

    Japan Society for the Promotion of Science  Grant-in-Aid for Scientific Research 

    Mahito Yamamoto

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    Authorship:Principal investigator  Grant type:Competitive

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  • Correlated oxides/atomically thin semiconductors heterostructures for steep-slope transistors applications

    2017.4 - 2019.3

    Japan Society for the Promotion of Science  Grant-in-Aid for Scientific Research 

    Mahito Yamamoto

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  • Polarity Control of Atomically Thin Film Transistors using Transition Metal Dichalcogenides Electrodes

    2017.4 - 2018.3

    Yazaki Memorial Foundation for Science and Technology  Grant of Encouragement of Young Scientists 

    Mahito Yamamoto

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Social Activities

  • 応用物理学会トータルバイオミメティクス研究グループ庶務幹事

    2020

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  • Nature Publishing Group Scientific Reports, Editorial Board Member

    2019

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  • The 16th International Symposium on Sputtering & Plasma Process 実行委員

    2019

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